Ion Plating (Coating) Technical Documentation [With Processing Results]
[Technical materials being presented!] Ion plating is optimal for creating highly adhesive films! Technical materials are currently available for free!
Ion plating is a method that involves passing evaporated particles through plasma to give them a positive charge, while applying a negative charge to the substrate to attract the evaporated particles and deposit them, creating a film. This allows for the formation of a film with stronger adhesion compared to traditional vapor deposition methods. **Features of Ion Plating** - Adhesion strength is stronger than that of vacuum deposition. - Good adhesion can be achieved even at low temperatures (with some exceptions for specific film types). - A variety of film formation conditions can be obtained. - Reactive films are possible. - Film coverage on shadows is better than that of vacuum deposition. - Alloy films are possible. *For more details, please request materials or view the PDF data available for download.*
- Company:東邦化研
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